Remote plasma
A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing method in which the plasma and material interaction occurs at a location remote from the plasma in the plasma afterglow.[1][2]
See also
- Chemical vapor deposition
- Corona treatment
- Physical vapor deposition
- Plasma activation
- Plasma chemistry
- Plasma cleaning
- Plasma-activated bonding
- Reactive ion etching
References
- ISBN 978-1-118-74742-1.
- ISBN 978-1-139-47173-2.
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