Trifluorosilane

Source: Wikipedia, the free encyclopedia.
Trifluorosilane
Names
IUPAC name
Trifluorosilane
Identifiers
3D model (
JSmol
)
ChemSpider
  • InChI=1S/F3HSi/c1-4(2)3/h4H checkY
    Key: WPPVEXTUHHUEIV-UHFFFAOYSA-N checkY
  • InChI=1S/F3HSi/c1-4(2)3/h4H
    Key: ZDHXKXAHOVTTAH-UHFFFAOYAH
  • F[SiH](F)F
Properties
HF3Si
Molar mass 86.09 g/mol
Appearance Colorless gas
Density 1.86 g/cm3
Melting point −131 °C (−204 °F; 142 K)
Boiling point −97.5 °C (−143.5 °F; 175.7 K)
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).

Trifluorosilane is the

free radical F3Si
is often also referred to as trifluorosilane, although more properly referred to as trifluorosilyl.

Preparation

Trifluorosilane has been purified and separated by low-temperature high-vacuum distillation. One preparation method involves products of the reaction between SbF3 and HSiCl3.[2] HSiCl3 is obtained by copper catalyzed reaction between HCl and Silicon at 200-400 °C.

Formation has also been reported in certain etching operations of silicon.[3]

Properties

The electric dipole moment of trifluorosilane is 1.26 debye.[4] The length of the silicon to fluorine bond is 1.555 Å, Si-H length is 1.55 Å, and ∠FSiF is 110°.[5]

References

Further reading