Disilane

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Disilane
Structural formula of disilane
Structural formula of disilane
Spacefill model of disilane
Spacefill model of disilane
Names
IUPAC name
Disilane
Identifiers
3D model (
JSmol
)
ChEBI
ChemSpider
ECHA InfoCard
 100.014.970 Edit this at Wikidata
368
UNII
  • InChI=1S/H6Si2/c1-2/h1-2H3 checkY
    Key: PZPGRFITIJYNEJ-UHFFFAOYSA-N checkY
  • InChI=1/H6Si2/c1-2/h1-2H3
    Key: PZPGRFITIJYNEJ-UHFFFAOYAQ
  • [SiH3][SiH3]
Properties
Si2H6
Molar mass 62.218 g·mol−1
Appearance Colourless gas
Density 2.7 g dm−3
Melting point −132 °C (−206 °F; 141 K)
Boiling point −14 °C (7 °F; 259 K)
Reacts[1]
Vapor pressure 2940.2±0.0 mmHg at 25°C[2]
Conjugate acid
 Disilanium
Structure
0 D
Hazards
Occupational safety and health (OHS/OSH):
Main hazards
 Extremely flammable
Related compounds
Related disilanes
 Hexamethyldisilane
Related compounds
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
checkY verify (what is checkY☒N ?)

Disilane is a

Friedrich Woehler and Heinrich Buff between 1857 and 1858, Moissan and Smiles were the first to explicitly identify disilane. They referred to disilane as silicoethane. Higher members of the homologous series SinH2n+2 formed in these reactions were subsequently identified by Carl Somiesky (sometimes spelled "Karl Somieski") and Alfred Stock
.

At

aryl, and mixtures of these groups) are called disilanes. Disilane is a group 14 hydride
.

Synthesis

Disilane is usually prepared by the hydrolysis of magnesium silicide. This reaction produces silane, disilane, and even trisilane. The method has been abandoned for the production of silane, but it remains viable for generating disilane.[3] The presence of traces of disilane is responsible for the spontaneous flammability of silane produced by hydrolysis by this method (analogously diphosphine is often the spontaneously pyrophoric contaminant in samples of phosphine).

It also arises by

photochemical[4]
and thermal decomposition of silane.

The reduction of Si2Cl6 with lithium aluminium hydride affords disilane in modest yield.[5]

Applications and reactions

Disilane and silane thermally decompose around 640 °C, depositing

photovoltaic devices.[3] Specifically it is utilized in the production of silicon wafers.[6]

More generally, diorganosilanes are produced by

silyl chlorides
, e.g.

2
(CH3)3SiCl + 2 Na → (CH3)3Si−Si(CH3)3 + 2 NaCl

Disilane gas can be used to control pressure of Si vapors during process of graphene growth by thermal decomposition of SiC. Pressure of Si vapors influences quality of produced graphene.[7]

References

  1. ISBN 978-1138561632
    .
  2. ^ "Disilane CAS#:1590-87-0".
  3. ^
    doi:10.1002/0471238961.1909120101181112.a01
    .
  4. ^ US Patent 4,604,274
  5. ^ P. W. Schenk "Silanes" in Handbook of Preparative Inorganic Chemistry, 2nd Ed. Edited by G. Brauer, Academic Press, 1963, NY. Vol. 1. p. 680.
  6. ^ Disilane Archived September 27, 2004, at the Wayback Machine
  7. ^ Mishra, N., Boeckl, J., Motta, N. and Iacopi, F. (2016), Graphene growth on silicon carbide: A review. Phys. Status Solidi A, 213: 2277-2289. doi:10.1002/pssa.201600091 (check page 2280)
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