130 nm process

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Semiconductor device fabrication
MOSFET scaling (process nodes)
0 20 µm  – 1968 010 µm – 1971 00 6 µm  – 1974 00 3 µm  – 1977   1.5 µm  – 1981 00 1 µm  – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 090 nm – 2003 065 nm – 2005 045 nm – 2007 032 nm – 2009 028 nm – 2010 022 nm – 2012 014 nm – 2014 010 nm – 2016 007 nm – 2018 005 nm – 2020 003 nm – 2022
Future 002 nm ~ 2024
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
v t e

The 130 nanometer (130 nm) process is a level of

The origin of the 130 nm value is historical, as it reflects a trend of 70% scaling every 2–3 years. The naming is formally determined by the International Technology Roadmap for Semiconductors (ITRS).

Some of the first

Processors using 130 nm manufacturing technology

• Motorola
  PowerPC 7447 and 7457
  2002
• IBM
  Gekko (GameCube
  )
• IBM
  PowerPC G5 970
  - October 2002 - June 2003
• Intel
  Tualatin
  - 2001-06
• Intel
  Tualatin
  -256 - 2001-10-02
• Intel
  Banias
  - 2003-03-12
• Intel Pentium 4 Northwood - 2002-01-07
• Intel Celeron Northwood-128 - 2002-09-18
• Intel Xeon Prestonia and Gallatin - 2002-02-25
• VIA C3 - 2001
• AMD
  Athlon XP
  Thoroughbred, Thorton, and Barton
• AMD Athlon MP Thoroughbred - 2002-08-27
• AMD Athlon XP-M Thoroughbred, Barton, and Dublin
• AMD Duron Applebred - 2003-08-21
• AMD K7 Sempron Thoroughbred-B, Thorton, and Barton - 2004-07-28
• AMD K8 Sempron Paris - 2004-07-28
• AMD Athlon 64 Clawhammer and Newcastle - 2003-09-23
• AMD Opteron Sledgehammer - 2003-06-30
• Elbrus 2000 1891ВМ4Я (1891VM4YA) - 2008-04-27 ^[1]
• MCST-R500S 1891BM3 - 2008-07-27 ^[2]
• Vortex 86SX - ^[3]

References

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