1 μm process
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Semiconductor device fabrication |
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MOSFET scaling (process nodes) |
Future
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The 1 μm process (1 micrometre process) is a level of
semiconductor process technology that was commercialized around the 1984–1986 timeframe,[1][2] by leading semiconductor companies like NTT, NEC, Intel and IBM. It was the first process where CMOS was common (as opposed to NMOS
).
The earliest MOSFET with a 1 μm
IBM T.J. Watson Research Center in 1974.[3]
Products featuring 1.0 μm manufacturing process
- Mbit DRAM memory chip was manufactured with the 1 μm process in 1984.[5]
- CPU launched in 1985 was manufactured using this process.[1]
- Intel uses this process on the CHMOS III-E technology.[6]
- Intel uses this process on the CHMOS IV technology.[7]
References
- ^ a b Mueller, S (21 July 2006). "Microprocessors from 1971 to the Present". informIT. Archived from the original on 19 April 2015. Retrieved 11 May 2012.
- ^ Myslewski, R (15 November 2011). "Happy 40th birthday, Intel 4004!". TheRegister. Archived from the original on 19 April 2015. Retrieved 19 April 2015.
- S2CID 283984.
- ^ Gealow, Jeffrey Carl (10 August 1990). "Impact of Processing Technology on DRAM Sense Amplifier Design" (PDF). Massachusetts Institute of Technology. pp. 149–166. Retrieved 25 June 2019 – via CORE.
- ^ "Memory". STOL (Semiconductor Technology Online). Retrieved 25 June 2019.
- ^ Intel Corporation, "New Product Focus: Components: Two-and Four-Megabit EPROMs are High-Density Performers", Microcomputer Solutions, September/October 1989, page 14
- ^ Intel Corporation, "New Product Focus: Components: New ASSP Suits Mobile Applications", Microcomputer Solutions, September/October 1990, page 11
External links
Preceded by 1.5 μm process |
MOSFET semiconductor device fabrication process | Succeeded by 800 nm process |