atomic force microscope, which opened the way to applying the technique to a large variety of materials.[3]
Basic principle
Currently, local oxidation experiments are performed with an
contact or noncontact mode with additional circuits to apply voltage pulses between tip and sample. The local oxidation process is mediated by the formation of a water meniscus.[4]
In order to perform local oxidation nanolithography, the
OH−
,O−) needed to form the oxide and confines the lateral extension of the region to be oxidized.
The chemical reactions that govern the local oxidation in a metallic substrate (M) are the following:[5]
while hydrogen gas is liberated at the AFM tip through the reduction reaction:
When the voltage pulse is off the AFM feedback forces the cantilever to recover its original oscillation amplitude withdrawing the tip from the sample and breaking the liquid meniscus. Finally the AFM continues to scan the sample thus allowing to image MOn nanostructure fabricated during the Local Oxidation process with the very same tip used for its fabrication.
The method to form liquid bridges is so precise that water meniscus diameters of 20 nm or below are easily obtained. This has led to the reproducible fabrication of sub-10 nm structures in silicon and other metallic surfaces.
Experimental setup
Local oxidation experiments can be performed with almost any kind of
relative humidity
generally helps to obtain more reproducible results. The size of the fabricated features depends on a number of parameters, such as the distance between the sample and the tip, the amplitude and the duration of the voltage pulse, and the relative humidity of the atmosphere.
Applications
The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology depends on the capability to fabricate, position and interconnect nanometer-scale structures.
Patterning
Local Oxidation Nanolithography allows to create a large variety of motives like dots, lines and letters with nanometer accuracy. In 2005, researchers at the
information storage or to design etch-resistant nanomasks in order to fabricate nanodevices
as well as many other applications.
Data storage
It is possible to store information using dot-like nanostructures created by the local oxidation of a surface. This storage uses the
Molecular template growth and preferential deposition
Local oxidation of silicon surfaces by noncontact atomic-force microscopy is an emerging and promising method for patterning surfaces at the nanometer scale due to its very precise control of the feature size. The features created with this technique can be used for the template growth and preferential deposition of different molecules like single-molecule magnets, biomolecules and conjugated organic molecules.
This method of nanopositioning is an important tool for the fabrication of new nanodevices based on the novel properties exhibited by some
groups (-NH2). Such termination electrostatically repels the Mn12 molecules. Subsequently, a pattern of silicon dioxide is defined by LON. The SMM molecules are predominantly deposited on the oxide motives because of electrostatic attraction. The electrostatic attraction between the silicon oxide fabricated by LON and the Mn12 molecules achieves the preferential deposition of this molecules with a nanoscale accuracy.
Fabrication of nanodevices
By using local oxidation nanolithography as tool for the fabrication of etch-resistant nanomasks, it is possible to fabricate nanoscale electronic devices, such as
top-down fabrication technique allows the fabrication of a large variety of SiNWs with different shapes, from angular to circular. It also allows the precise positioning of the silicon nanowires in any desired position, making easier its integration; indeed, this technique is compatible with the standard silicon CMOS processing technology. Single crystalline silicon nanowires have already shown a great potential as ultrasensitive sensors by detecting changes in the nanowire conductivity when a specific analyte is present.[9]
Local oxidation nanolithography, therefore, is a promising technique to allow the realisation of array of biosensors.