Local oxidation nanolithography: Difference between revisions
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==External links== |
==External links== |
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*[http://www.imm.cnm.csic.es/spm/index.html Local oxidation nanolithography page in García's research group at CSIC] |
*[https://web.archive.org/web/20100409061053/http://www.imm.cnm.csic.es/spm/index.html Local oxidation nanolithography page in García's research group at CSIC] |
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*[http://www.phy.bris.ac.uk/groups/nanophysics/research/struct_nanofab.html Miles' research group at the University of Bristol] |
*[http://www.phy.bris.ac.uk/groups/nanophysics/research/struct_nanofab.html Miles' research group at the University of Bristol] |
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*[http://www.stanford.edu/group/quate_group/Litho/LithoPages/OxidationofSilicon/OxidationofSiliconFrame.html Quate's group at Stanford University] |
*[http://www.stanford.edu/group/quate_group/Litho/LithoPages/OxidationofSilicon/OxidationofSiliconFrame.html Quate's group at Stanford University] |
Revision as of 22:58, 4 January 2018
Local oxidation nanolithography (LON) is a
The first materials on which LON was demonstrated were
History
The local oxidation of a surface by means of a
Basic principle
Currently, local oxidation experiments are performed with an
In order to perform Local Oxidation Nanolithography, the
The chemical reactions that govern the Local Oxidation in a metallic substrate (M) are the following:[5]
while hydrogen gas is liberated at the AFM tip through the reduction reaction:
When the voltage pulse is off the AFM feedback forces the cantilever to recover its original oscillation amplitude withdrawing the tip from the sample and breaking the liquid meniscus. Finally the AFM continues to scan the sample thus allowing to image MOn nanostructure fabricated during the Local Oxidation process with the very same tip used for its fabrication.
The method to form liquid bridges is so precise that water meniscus diameters of 20 nm or below are easily obtained. This has led to the reproducible fabrication of sub-10 nm structures in silicon and other metallic surfaces.
Experimental setup
Local oxidation experiments can be performed with almost any kind of
Applications
The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology depends on the capability to fabricate, position and interconnect nanometer-scale structures.
Patterning
Local Oxidation Nanolithography allows to create a large variety of motives like dots, lines and letters with nanometer accuracy. In 2005, researchers at the
Data storage
It is possible to store information using dot-like nanostructures created by the local oxidation of a surface. This storage uses the
Molecular template growth and preferential deposition
Local oxidation of silicon surfaces by noncontact atomic-force microscopy is an emerging and promising method for patterning surfaces at the nanometer scale due to its very precise control of the feature size. The features created with this technique can be used for the template growth and preferential deposition of different molecules like single molecule magnets, biomolecules and conjugated organic molecules. This method of nanopositioning is an important tool for the fabrication of new nanodevices based on the novel properties exhibited by some
Fabrication of nanodevices
By using local oxidation nanolithography as tool for the fabrication of etch-resistant nanomasks, it is possible to fabricate nanoscale electronic devices, such as
References
- ^ PMID 16365640.
- doi:10.1063/1.102999.
- doi:10.1063/1.109259.
- doi:10.1063/1.370985.
- ^ ISBN 3-540-26912-6.
- doi:10.1063/1.125390.
- doi:10.1039/b901955n.
- PMID 18826289.
- PMID 11509722.