VMOS

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The VMOS structure has a V-groove at the gate region

A VMOS (/ˈvmɒs/) (vertical metal oxide semiconductor or V-groove MOS) transistor is a type of metal–oxide–semiconductor field-effect transistor (MOSFET). VMOS is also used to describe the V-groove shape vertically cut into the substrate material.[1]

The "V" shape of the

source to the drain of the device. The shape of the depletion region
creates a wider channel, allowing more current to flow through it.

During operation in blocking mode, the highest electric field occurs at the N+/p+ junction. The presence of a sharp corner at the bottom of the groove enhances the electric field at the edge of the channel in the depletion region, thus reducing the breakdown voltage of the device.[2] This electric field launches electrons into the gate oxide and consequently, the trapped electrons shift the threshold voltage of the MOSFET. For this reason, the V-groove architecture is no longer used in commercial devices.

The device's use was a

power device until more suitable geometries, like the UMOS (or Trench-Gate MOS) were introduced in order to lower the maximum electric field
at the top of the V shape and thus leading to higher maximum voltages than in case of the VMOS.

History

The first

Mohamed Atalla and Dawon Kahng at Bell Labs in 1959.[3] The V-groove construction was pioneered by Jun-ichi Nishizawa in 1969,[4] initially for the static induction transistor (SIT), a type of junction field-effect transistor (JFET).[5]

The VMOS was invented by

In 1978,

American Microsystems (AMI) released the S2811.[10][11] It was the first integrated circuit chip specifically designed as a digital signal processor (DSP), and was fabricated using VMOS, a technology that had previously not been mass-produced.[11]

References

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